Positive Printed Circuit Board Photoresist (PCBPR)
Product Introduction
Prosperity Integration, Inc. is currently
distributing liquid photoresist and the equipment for printed circuit board
(PCB) products in the North America. PCBPR (Printed circuit board photoresist)
is produced by Everlight Chemical Industrial Corporation (ECIC) in Taiwan.
ECIC is a high-tech chemical manufacturer whose development in the research
and production technology has achieved distinguished recognition in the
field of dyes, specialty chemicals, pharmaceuticals, and electronic specialty
chemicals. ECIC is an ISO 9001 & 9002 company and has also awarded
ISO 14001 certification. ECIC is a public company and plans on achieving
the sales goal of 10 billion NT Dollars in year 2000. With electronic
devices getting smaller and faster, the PCB industry requires new electronic
chemical to stay competitive and enter new technical field.
Traditionally photoresist applied in PCB patterning is
mostly negative dry film photoresist or negative liquid photoresist that
has problem in controlling the linewidth during the patterning process
because it has swelling phenomena in development. Therefore ECIC has developed
positive liquid photoresist to deal with the problem. Positive liquid photoresist
which can be applied to process etching of inner- or outer-layer board
and can be applied with the appropriate coating methods to achieve better
control in line widths, excellent resolution, and good durability at lower
cost. In addition, the application of PCBPR on the defective surface copper-clad
will not affect its adherence. This will increase process stability.
ECIC has developed the positive liquid photoresist with
novolak that is different from the major resin of negative photoresit.
Novolak is better in many aspects such as linewidth, resolution, hardness,
etch resistance, and durability. Under optimal condition, it requires less
coating thickness to achieve the performance that results in cost reduction
and higher quality. Therefore novolak resin as photoresist is particularly
very beneficial to the manufacture of fine line PCBs. Novolak liquid photoresist
is currently used in IC manufacturing widely.
Prosperity Integration, Inc. looks forward to assisting
the customers in the North America to meet their PCBPR and equipment needs
in fine line etched PCB prototype preparation and mass production.
PCBPR SPECIFICATION:
|
Photoresist Type
|
Positive liquid photoresist
|
|
Main component
|
Resin and photoactive compound
|
|
Appearance
|
Green liquid (under yellow light)
|
|
Solid content
|
30-40%
|
|
Linewidth
|
Minimum 15 um (0.6 mil)
|
|
Viscosity (cps)
|
65-75 (25°C)
|
|
Coating thickness
|
4-5 um (dry)
|
|
Dry time
|
5 min (80° C)
|
|
Hardness
|
4H
|
|
Exposure energy
|
150 mJ/cm2
|
|
Developer
|
PH = 12-13 (Na2SiO3/KOH)
|
|
Development time
|
30 sec
|
FEATURES:
-
High resolution
-
Reliable tenting up to 0.6 mil
-
Short developing time
-
Superior resistance to all acid plating
-
Easy stripping and filterable
-
Large process window
-
Excellent contrast after exposure for easy inspection
-
Good leveling for copper clad laminate
PCBPR PROCESSING:
| Process |
Condition |
| Pretreatment |
Brushing film, degreasing, cleaning |
| Coating |
The thickness of wet film, 10-12 um
The thickness of dry film, 4-5 um |
| Dryness |
80oC for 5 minutes |
| Exposure |
150-200 mJ/cm2 |
| Development |
1-3 wt% Na2SiO3/KOH |
| Etching |
FeCl2/CuCl2 |
| Stripping |
2-4 wt%NaOh (aq) |
PCB PRETREATMENT FOR PCBPR COATING:
For superior photoresist film adhesion,
surface of copper clad laminate is required to clean, dry, free oil, free
contaminates.
The procedure to clean PCB is as follows:
1.
The copper-clad laminate surface is cleaned by automatic srubbing machine
with acid pumice slurry or cleaning chemicals.
2.
Water rinse.
3.
Cleaned with mixture of aqua solution and 5% H2SO4
rinse. The aqua solution contains 5% H2O2.
4.
Water rinse.
5.
Dryness with clean air.
6.
Dried in oven at 40-65°C for 5 mins.
Note: If dryness is too long,
it will cause oxidation on surface of copper clad laminate.
PCBPR COATING:
PCBPR is coated on copper surface
by roll coater or the other coating techniques. Film thickness can be adjusted
based on the type of roll coaters used, photoresist viscosity, and solid
content. The other coating parameters are listed in Table 1.
TABLE 1
|
Roll temperature
|
25 - 40°C (77 - 104°F)
|
|
Roll speed
|
2 – 6 m/min (6 – 19 feet/min)
|
|
Operating temperature
|
25 – 30°C
|
PCBPR DRYING:
Normally after coating, it prefers to
use convection type of clean oven. Two ways to dry PCBPR film can be applied.
They can be dried either at static or at continuous-gradient and are listed
in Table 2.
TABLE 2
|
Static
|
80°C
for 5 mins
|
|
Continuous-gradient
|
80 –120°C
for 2-3 mins
|
EXPOSURE:
After drying the PCBPR film in a clean
oven, the photoresist coated layer may be immediately exposed and developed
for better performance. With contact or proximity broad beam phototool,
the mask is positioned above the photoresist film. The exposure parameters
are shown in Table 3.
TABLE 3
|
UV wavelength
|
350 nm
|
|
Vacuum time
|
3-5 sec
|
|
Exposure energy
|
100 – 200 mJ/cm2
|
PCBPR DEVELOPMENT:
After exposure, the exposed area is
removed in the development step. The developing conditions are listed in
Table 4.
TABLE 4
|
Developing system
|
1– 3 wt % Na2SiO3/KOH
|
|
Developing time
|
20 – 30 sec
|
|
Pressure
|
Normal pressure
|
ETCHING:
Etching is conducted in acid solution.
The unprotected copper surface will be etched since there are no photoresist
to protect. The parameters for etching are shown in Table 5.
TABLE 5
|
Etching system
|
H2O2/HCl CuCl2
or FeCl2
|
|
Temperature
|
50°C
|
|
Spray pressure
|
1 – 3 kg/cm2 (15 – 45 psi)
|
|
Etching time
|
100 – 200 sec
|
STRIPPING:
Stripping is done in alkaline solution.
The conditions for stripping are indicated in Table 6.
TABLE 6
|
Stripping system
|
NaOH (aq) (2 –4 wt %)
|
|
Temperature
|
40 - 60° C (104 – 140°F)
|
|
Spray pressure
|
1 – 3 kg/cm2 (15 – 45 psi)
|
|
Stripping time
|
50 – 100 sec
|
PCBPR STORAGE:
During storage of PCBPR, keep off the
actinic light and store in a cool and dry place. The storage temperature
is recommended at 5 – 20°C (40 – 70°F). The relative humidity is
suggested at 60 ± 10%. With the storage at the above conditions,
the maximum shelf life and product performance can be assured.
NOTICE:
The information contained herein is
correct to our knowledge. As different type of equipment result in different
outcome slightly. The suggested process parameters are based on the experience
from the laboratory and the production lines.